Auto/Manual Tune and Control

Plasma enclosures, plasma torches, or other loads needing RF power often have impedances differing from the standard 50 ohms, frequently including an inductive and capacitive component. To ensure optimal power delivery, the system must adjust this impedance to match that of the RF generator. This adjustment minimizes power reflection, safeguards the RF generator, maximizes power transfer to the load, ensures repeatable processes, and maintains the required field intensity within the enclosure before and after plasma formation.

The impedance matching network, also known as the matchbox, fulfills this essential role. Typically, matching networks are designed to operate within an impedance range of 3 to 35 ohms. However, these networks are also versatile enough to cater to unique loads such as sputtering guns, reactive ion etchers (RIEs), loads with capacitive-inductive coupling, and complex requirements like helicon ion sources, atmospheric ICPs in both E and H modes, plasma torches, and other nonstandard impedances.

Automatic Impedance Matching Network

Our automatic impedance matching networks, such as the ATN-xx-BF, offer compatibility with RF generators for processes like PECVD, HDCVD, sputtering, and ashing. These systems utilize DC motors to handle impedance adjustments, transforming the plasma enclosure’s impedance to 50 ohms, ensuring maximum generator power is delivered efficiently to the enclosure.

These networks operate in three distinct modes:

Various parameters can be monitored and adjusted through the controller’s front panel and VGA connections. Notably, the ATN-xx-BF networks achieve full impedance matching and plasma ignition in as little as two seconds for standard loads.

Available in configurations for 300W, 1000W, 2000W, 3000W, and 5000W power capacities, these networks cater to a wide array of operational requirements.

Manual Impedance Matching Network

Manual Impedance Matching Network model offers a reliable solution for impedance matching with RF generators in applications like PECVD, HDCVD, sputtering, and ashing. Manual adjustments are easily managed via controls on the front panel, allowing fine-tuning of the plasma enclosure’s impedance to 50 ohms and optimizing generator power delivery to the enclosure.

It is valued for its moderate pricing and flexibility across a broad range of standard and custom impedance levels. The inclusion of a precision gearbox further enhances adjustment accuracy, making it a versatile choice for varied applications.